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It is not practical to consider every impurity or contaminant that might be present
SEMI E174-0618 (technical revision)
but that is beyond the scope of this Standard
2-0915 (first published)
This Standard specifies the measurement method of polarizing films and other films for FPD by using contour matching method
E12900 - SEMI E129 - Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility Lang-English It is not practical toThe purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing environments. It is a guide for establishing electrostatic compatibility in facilities used for semiconductor manufacturing. Electrostatic compatibility of production equipment is addressed in SEMI E78. Electrostatic surface charge causes a number of undesirable effects in semiconductor manufacturing
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