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SEMI M10 — Standard Nomenclature for Identification of Structures and Features Seen on Gallium Arsenide
3 Based on the result of investigation for human eye’s sensitivity to Mura in ergonomics approach
This method is to be used by CCFL suppliers and users to evaluate quality of products as well as items under development
The interface allows access to the properties and services of specific objects
P00900 - SEMI P9 - Guide for Functional Testing of Microelectronic Resists Revision:SEMI P9-89 - Superseded without dependence on operator orThe purpose of this Guide is to provide a baseline program of test procedures needed to functionally test liquid developed resists, resist developers, and rinses for microelectronic applications. It can also be used as a guide to evaluate process modifications to such systems. This Guide is intended to be applicable for photo, DUV, X ray, and electron beam processes. Virtually all lithographic fabrication processes vary in some way from location to