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The purpose of this Document is to define a method for characterizing a mass flow controller (MFC) being considered for installation into a gas distribution system
Application of this Test Method is expected to yield comparable data among regulators tested for qualification purposes
the issue is control of film thickness variation introduced by nanotopography
The purpose of this Document is to standardize requirements for dimethyl sulfoxide used in the semiconductor industry and testing procedures to support those standards
1 — Specification for Inspection and Review Specific Equipment Model (ISEM)
M08500 - SEMI M85 - Guide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry StdTpc-Glass Wafer The purpose of this DocumentReduction of surface metal contamination below a concentration in accordance with the ITRS road map is a key issue for silicon wafer quality for most of the leading edge technology applications. This Document provides a guide for a high sensitivity measurement of trace metal contamination on the surface of a semiconductor grade silicon wafer by using inductively coupled plasma mass spectrometry (ICP MS). This Guide describes the procedure for trace